| CS-UP 70N | Ultra-high purity | 72 nm | 20% | ≈7 | None (near neutral) | AR coatings, high-purity catalysts, electronics |
| CS-UP 135K | Ultra-high purity | 137 nm | 40% | ≈10 | Potassium | Large-particle polishing, wafer and substrate stock removal |
| CS-HP 27K | High purity | 27 nm | ≈40% | alkaline | Potassium | Glass, sapphire and optical polishing |
| CS-HP 41K | High purity | 41 nm | ≈40% | alkaline | Potassium | Precision polishing, silica supports |
| CS-HP 74K | High purity | 74 nm | ≈40% | alkaline | Potassium | Sapphire and hard-disk substrate polishing |
| CS-CAT series | Standard | 5–110 nm | to 40% | 2–10 | Ammonium, acidic, neutral | Zeolite and molecular-sieve binders, washcoats |
| CS-COAT series | Standard | 5–110 nm | to 40% | 2–11 | Silane-modified, acidic, neutral, alumina-modified, sodium | Wood and clear coats, sol-gel, inorganic and heat-resistant coatings |